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CN: DemoJournal-CN
ISSN: DemoJournal-ISSN
Research Article Archive • Versions 2 Vol 2 (1) : 19020103 2019
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Nitridation-Etch of Silicon Oxide in Fluorocarbon/Nitrogen Plasma: A Computational Study
Du Zhang, Yu-Hao Tsai, Hojin Kim, Mingmei Wanghidden
Received： 2019 - 02 - 21
Accepted： 2019 - 03 - 22
5361 93 0
CSCD  ·  Baidu Scholar
References
Journal of Microelectronic Manufacturing

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